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Moorfield NanoTechnology

High-temperature vacuum annealing for planar substrates, up to 1000 °C, with precision gas and pressure control—all in a benchtop package.

ANNEAL vacuum annealing systems from Moorfield are optimised for the thermal treatment of 2D materials and wafers under controlled atmospheres.

Product

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Optimised for the thermal treatment of 2D materials and wafers under controlled atmospheres

Substrates are supported face-up on stage-top platens that are situated centrally inside a stainless-steel high-vacuum chamber fitted with appropriate heat shielding and a shuttered viewport. Heating is via a heat source located beneath the platen. Maximum temperatures up to 1000 °C are possible—depending on the heating technology used.

ANNEAL systems are highly modular and can be configured .